In semiconductor wafer manufacturing, protecting against particulate contamination during the deposition and diffusion processes is a primary concern since contaminants can lead to defects in the finished wafers, resulting in reduced yield and increased scrap.
A critical machine in the deposition and diffusion processes is a positive displacement multi-stage dry vacuum pump.
Learn how ifm solutions monitor the health of your pump in real time to potentially save you millions of dollars in scrapped wafers.
(Run time 2:40)